Photograph of a graph showing intensity counts versus wavelength in nanometers, with labeled peaks at 276.18 nm, 287.63 nm, 294.48 nm, 404.06 nm, 417.77 nm, 575.46 nm, and 589.22 nm.

Ga2O3
PL

Using the 266 nm kit at high intensity allowed observation of atomic lines from the plasma

plume during sample damage. The sharp atomic lines of neutral gallium are superimposed on the PL signal from Ga2O3.

The wavelength of the laser is strongly resonant with the neutral gallium state, facilitating observation through the LEAFS effect.

Note: the peaks at > 550 nm are second order grating reflections of the higher energy line